Technologies have been developed for laser-assisted deposition of thin films from the
following materials: HTSC films, GaAs, InGaAs, PbTe, Bi, ZrO2, SrTiO3,
ZnO, and diamond-like films.
Laser deposition plants fitted with systems to exercise computer control and monitoring of the pulsed laser-plasma
deposition process have been built.
Technologies have been devised for deposition of HTSC films from metals, semiconductors
and dielectrics i.e. the materials of the basic structures of components used in
optoelectronics and microelectronics.
Technologies have been developed for laser-plasma deposition of:
quantum-dimensional structures;
films from composite materials for optoelectronics;
ultrathin metallic films for diffusion barriers in microelectronics.
